Researcher in Development of Plasma Etching Processes for III-V Lasers for Silicon Photonic Integration

Centre National de la Recherche Scientifique

Posted: 19 September 2026 - Grenoble, France

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About this opening

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The position involves developing plasma etching processes for III-V semiconductor lasers integrated on silicon substrates. The researcher will investigate etching mechanisms and develop processes to achieve selective etching and minimal damage.

Position details

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  • Role: researcher
  • Employment type: full time
  • Research field: Engineering
  • Research topic: Plasma Etching Processes
  • Language: French
  • Start date: 1 January 2027
  • Application deadline: 9 October 2026

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